Job Experience

Department of Electrical and Computer Engineering,
Auburn University Department of Electrical and Computer Engineering,
Auburn University

Education

Department of Electrical and Computer Engineering,
Auburn University Department of Electrical and Computer Engineering,
Auburn University Information Engineering,
East China University of Science and Technology

Imaging Processing

• Functional Magnetic Resonance Imaging
• Statistical Analysis of fMRI Data
• Cluster-based Analysis of fMRI Data
• Machine Learning

Electron-beam Lithography

• Stochastic Exposure Simulation
• Resist Profile Simulation
• Critical Dimension and Line Edge Roughness Reduction
• Scanning Electron Microscope Image Simulation

Dependency Analysis of Line Edge Roughness in Electron-beam Lithography
X. Zhao, S.Y. Lee, et. al.
Microelectronic Engineering 133, 78-87, 2015.
[link] [BibTex]

Determination and Analysis of Minimum Dose for Achieving Vertical Sidewall in Electron-beam Lithography X. Zhao, Q. Dai, S.Y. Lee, et. al.
Journal of Vacuum Science & Technology B32(6), 06F508, 2014. Microelectronic Engineering 133, 78-87, 2015.
[link] [BibTex]

Minimization of Line Edge Roughness and Critical Dimension Error in Electron-beam Lithography
X. Zhao, S.Y. Lee, et. al.
Journal of Vacuum Science & Technology B32(6), 06F505, 2014.
[link] [BibTex]

Fast Simulation of Stochastic Exposure Distribution in Electron-beam Lithography
X.Zhao, S.Y. Lee, et. al.
Journal of Vacuum Science & Technology B30(6), 06F308, 2012.
[link] [BibTex]